JAEA
  • help
  • PC | SP
  • JP | EN
          
Refine your search：     
Report No.
 - 
Clear All
Search Results: Records 1-20 displayed on this page of 74

Presentation/Publication Type

Initialising ...

Refine

Journal/Book Title

Initialising ...

Meeting title

Initialising ...

First Author

Initialising ...

Keyword

Initialising ...

Language

Initialising ...

Publication Year

Initialising ...

Held year of conference

Initialising ...

Save select records

Journal Articles

Development on laser cutting technique to suppress spatter particles aiming at disposal of radio-active waste

Naoe, Takashi; Teshigawara, Makoto; Futakawa, Masatoshi; Mizutani, Haruki; Muramatsu, Toshiharu; Yamada, Tomonori; Ushitsuka, Yuji*; Tanaka, Nobuatsu*; Yamasaki, Kazuhiko*

Proceedings of 8th International Congress on Laser Advanced Materials Processing (LAMP 2019) (Internet), 5 Pages, 2019/05

Laser cutting is one of the options in the disposal of radio-active waste, such as spallation neutron target vessel in J-PARC, etc. Due to unique characteristic of laser, such as non-contact system, it is more easily to provide remote-controlled system in comparison with conventional one, such as mechanical cutting machine, etc. However, a demerit of laser cutting is the sputter and fume caused by laser cutting, resulting in contamination with radio-active materials its surroundings. Recently it was developed that the spatter suppression technique by controlling laser beam profile in laser welding process. In order to apply this suppression technique to laser cutting, first of all, we attempted to observe the phenomenon at melting area during laser cutting using a high-speed video camera in order to make the physical model. The result showed that the appearance of fume and sputter were independently confirmed in the time evolution.

Journal Articles

Growth of single-phase nanostructured Er$$_2$$O$$_3$$ thin films on Si (100) by ion beam sputter deposition

Mao, W.*; Fujita, Masaya*; Chikada, Takumi*; Yamaguchi, Kenji; Suzuki, Akihiro*; Terai, Takayuki*; Matsuzaki, Hiroyuki*

Surface & Coatings Technology, 283, p.241 - 246, 2015/12

https://doi.org/10.1016/j.surfcoat.2015.10.060
 Times Cited Count：3 Percentile：13.89(Materials Science, Coatings & Films)

Single-phase nanocrystalline thin films of Er$$_2$$O$$_3$$ (440) has been first prepared using Si (100) substrates by ion beam sputter deposition at 973 K at a pressure of $$<$$ 10$$^{-5}$$ Pa and $${it in}$$-$${it situ}$$ annealing at 1023 K at a pressure of $$approx$$ 10$$^{-7}$$ Pa. Er silicides formed during the deposition are eliminated via the annealing, which results in the single phase and the smooth surface of the Er$$_2$$O$$_3$$ thin films. The epitaxial relationship between Si (100) and Er$$_2$$O$$_3$$ (110) is clarified by X-ray diffraction and reflection high energy electron diffraction.

Journal Articles

Film growth method by means of ion beam sputtering

Yamaguchi, Kenji

Shirisaidokei Handotai No Kagaku To Gijutsu, p.113 - 121, 2014/09

This article describes first the basic aspects of sputtering phenomena based on ion beam - solid interactions, followed by introduction of ion beam sputter deposition (IBSD) method for thin film fabrication. The article further introduces the experimental apparatus for IBSD application, equipped with an ion beam irradiation system for sputter-etching of the substrate surface. It is shown that this method is suitable for fabrication of semiconducting iron silicide film on Si substrate. The experimental results revealed that the obtained thin film is highly-oriented and continuous, forming atomically flat interface between film and the substrate.

Journal Articles

Effect of thermal annealing on the photoluminescence from $$beta$$-FeSi$$_2$$ films on Si substrate

Yamaguchi, Kenji; Shimura, Kenichiro; Udono, Haruhiko*; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi; Hojo, Kiichi

Thin Solid Films, 508(1-2), p.367 - 370, 2006/06

https://doi.org/10.1016/j.tsf.2005.07.354
 Times Cited Count：12 Percentile：49.71(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Characterization of photoluminescence of $$beta$$-FeSi$$_2$$ thin film fabricated on Si and SIMOX substrate by IBSD method

Shimura, Kenichiro; Yamaguchi, Kenji; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi; Hojo, Kiichi

Vacuum, 80(7), p.719 - 722, 2006/05

https://doi.org/10.1016/j.vacuum.2005.11.034
 Times Cited Count：9 Percentile：34.33(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Photoluminescence of $$beta$$-FeSi$$_2$$ thin film prepared by ion beam sputter deposition method

Shimura, Kenichiro; Yamaguchi, Kenji; Yamamoto, Hiroyuki; Sasase, Masato*; Shamoto, Shinichi; Hojo, Kiichi

Nuclear Instruments and Methods in Physics Research B, 242(1-2), p.673 - 675, 2006/01

https://doi.org/10.1016/j.nimb.2005.08.175
 Times Cited Count：6 Percentile：43.85(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Modification of thin SIMOX film into $$beta$$-FeSi$$_2$$ via dry processes

Shimura, Kenichiro; Yamaguchi, Kenji; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi; Hojo, Kiichi

Nuclear Instruments and Methods in Physics Research B, 242(1-2), p.676 - 678, 2006/01

https://doi.org/10.1016/j.nimb.2005.08.169
 Times Cited Count：0 Percentile：0.01(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Effect of target compositions on the crystallinity of $$beta$$-FeSi$$_2$$ prepared by ion beam sputter deposition method

Yamaguchi, Kenji; Heya, Akira*; Shimura, Kenichiro; Katsumata, Toshinobu*; Yamamoto, Hiroyuki; Hojo, Kiichi

Thin Solid Films, 461(1), p.17 - 21, 2004/08

https://doi.org/10.1016/j.tsf.2004.02.052
 Times Cited Count：4 Percentile：25.12(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

Yamaguchi, Kenji; Haraguchi, Masaharu*; Katsumata, Toshinobu*; Shimura, Kenichiro; Yamamoto, Hiroyuki; Hojo, Kiichi

Thin Solid Films, 461(1), p.13 - 16, 2004/08

https://doi.org/10.1016/j.tsf.2004.02.051
 Times Cited Count：10 Percentile：46.84(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

The Role of sputter etching and annealing processes on the formation of $$beta$$-FeSi$$_{2}$$ thin films

Shimura, Kenichiro; Katsumata, Toshinobu*; Yamaguchi, Kenji; Yamamoto, Hiroyuki; Hojo, Kiichi

Thin Solid Films, 461(1), p.22 - 27, 2004/08

https://doi.org/10.1016/j.tsf.2004.02.053
 Times Cited Count：8 Percentile：41.01(Materials Science, Multidisciplinary)

On the formation of $$beta$$-FeSi$$_{2}$$ using Ion Beam Sputter Deposition (IBSD) method, sputter etching (SE) followed by thermal annealing is effective substrate treatment to obtain highly (100) oriented $$beta$$-FeSi$$_{2}$$ on Si (100). However the best condition of these treatments are not yet known. In this work, the effect of sputter etching (SE) together with annealing process on the orientation of the film is investigated. In prior to the deposition of Fe, the substrate is irradiated by Ne$$^{+}$$ ion with various energy and fluence followed by thermal annealing at 1027 K for 60 minuets. The overall results show the most suitable SE condition using Ne$$^{+}$$ ion on IBSD method is the energy of 1keV with the fluence of 30$$times$$10$$^{19}$$ ions/m$$^{2}$$.

Journal Articles

First wall issues related with energetic particle deposition in a tokamak fusion power reactor

Tobita, Kenji; Nishio, Satoshi; Konishi, Satoshi; Sato, Masayasu; Tanabe, Tetsuo*; Masaki, Kei; Miya, Naoyuki

Fusion Engineering and Design, 65(4), p.561 - 568, 2003/07

https://doi.org/10.1016/S0920-3796(02)00386-1
 Times Cited Count：20 Percentile：77.2(Nuclear Science & Technology)

no abstracts in English

Journal Articles

Fabrication and stability of binary clusters by reactive molecular ion irradiation

Yamamoto, Hiroyuki; Saito, Takeru

Nuclear Instruments and Methods in Physics Research B, 206(1-4), p.42 - 46, 2003/05

https://doi.org/10.1016/S0168-583X(03)00713-4
 Times Cited Count：14 Percentile：66.94(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Characterization of air-exposed surface $$beta$$-FeSi$$_{2}$$ fabricated by ion beam sputter deposition method

Saito, Takeru; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Nakanoya, Takamitsu; Hojo, Kiichi; Haraguchi, Masaharu*; Imamura, Motoyasu*; Matsubayashi, Nobuyuki*; Tanaka, Tomoaki*; Shimada, Hiromichi*

Nuclear Instruments and Methods in Physics Research B, 206, p.321 - 325, 2003/05

https://doi.org/10.1016/S0168-583X(03)00754-7
 Times Cited Count：7 Percentile：46.83(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Effect of surface treatment of Si substrate on the crystal structure of FeSi$$_{2}$$ thin film formed by ion beam sputter deposition method

Haraguchi, Masaharu*; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Nakanoya, Takamitsu; Saito, Takeru; Sasase, Masato*; Hojo, Kiichi

Nuclear Instruments and Methods in Physics Research B, 206, p.313 - 316, 2003/05

https://doi.org/10.1016/S0168-583X(03)00752-3
 Times Cited Count：17 Percentile：72.74(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Development of semiconductor material ($$beta$$-FeSi$$_2$$ film) for next generation using IBSD method

Heya, Akira*; Haraguchi, Masaharu*; Yamamoto, Hiroyuki; Saito, Takeru*; Yamaguchi, Kenji; Hojo, Kiichi

Ishikawaken Kogyo Shikenjo Heisei-14-Nendo Kenkyu Hokoku, (52), p.9 - 12, 2003/00

no abstracts in English

Journal Articles

Effect of treatment for Si substrate on the crystal structure of $$beta$$-FeSi$$_{2}$$ thin film

Haraguchi, Masaharu; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Sasase, Masato*; Nakanoya, Takamitsu; Saito, Takeru; Hojo, Kiichi

Shinku, 45(10), p.749 - 753, 2002/10

https://doi.org/10.3131/jvsj.45.749

no abstracts in English

Journal Articles

Measurement of the chemical sputtering yields of CH$$_{4}$$/CD$$_{4}$$ and C$$_{2}$$H$$_{x}$$/C$$_{2}$$D$$_{x}$$ at the carbon divertor plates of JT-60U

Nakano, Tomohide; Kubo, Hirotaka; Higashijima, Satoru; Asakura, Nobuyuki; Takenaga, Hidenobu; Sugie, Tatsuo; Itami, Kiyoshi

Nuclear Fusion, 42(6), p.689 - 696, 2002/06

https://doi.org/10.1088/0029-5515/42/6/307
 Times Cited Count：46 Percentile：79.09(Physics, Fluids & Plasmas)

no abstracts in English

Journal Articles

Sputtering of nano-crystalline gold by high energy heavy ions

Matsunami, Noriaki*; Sataka, Masao; Iwase, Akihiro; Inami, Takashi*; Kobiyama, Mamoru*

Journal of Nuclear Materials, 302(2-3), p.206 - 210, 2002/04

https://doi.org/10.1016/S0022-3115(02)00773-0
 Times Cited Count：8 Percentile：47.9(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Electronic sputtering of oxides by high energy heavy ion impact

Matsunami, Noriaki*; Sataka, Masao; Iwase, Akihiro

Nuclear Instruments and Methods in Physics Research B, 193(1-4), p.830 - 834, 2002/01

https://doi.org/10.1016/S0168-583X(02)00912-6
 Times Cited Count：27 Percentile：83.24(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Fabrication of highly oriented $$beta$$-FeSi$$_{2}$$ by ion beam sputter deposition

Nakanoya, Takamitsu; Sasase, Masato*; Yamamoto, Hiroyuki; Saito, Takeru; Hojo, Kiichi

Shinku, 45(1), p.26 - 31, 2002/01

https://doi.org/10.3131/jvsj.45.26

no abstracts in English

74 (Records 1-20 displayed on this page)